For coating deposition Sputtek is using cathodic arc and sputtering processes. These technologies are used either in separate PVD coating machines or in the same machine for hybrid processes. Sputtek cathodic Arc process is a unique process conducted in a specifically designed machines which allows plasma densification by using plasma optical system. Such plasma densification allows to deposit coating with the unique properties such as high hardness, low coefficient of friction, higher thickness and low internal stresses. Added sputtering allows to deposit coatings from the cathode materials being not suitable for the cathodic arc process , and to grow nano- composite and nano-layered coatings. Our equipment also allows to offer so called duplex process by providing rapid ion nitriding case hardening process in one technological cycle with PVD coating.