Machines
MODULAR DUPLEX UNIVERSAL SPUN 4
The plasma managing system of this PVD coating machine allows coating deposition in highly concentrated and ionized conditions. The result is the deposition of dense coatings with low internal stresses.
Description
Parameters
Chamber volume
4.6m³
Chamber Dimensions
3.2m L x 1.5m H x 1.7m D
Effective Coating Area
2 zones diameter 1m x 0.8m
Number of Doors / Sub Doors
2 Rotating table with 6 planetary tilted sub tables with adjustable angles (0 – 25 degree)
Table Diameter
1,000mm x 2
Maximum weight of the load per Table / Sub Table
2,500/350 lb
Maximum Load Per Machine
5,000 lb
Maximum part weight
2,000 lb
Maximum part height
700mm
Chamber / DoorMaterial
Stainless steel
Maximum vacuum level
10-5 torr
Vacuum recovery time
60 min form atmosphere to working vacuum degree
Heaters
Infrared heaters 60 KW evenly installed inside the chamber around each table
Process Temperature
150-650°C
Shields
2 sets
Gas Distribution System
6 flow meters
Cooling system
SS water chanels
Vacuum system
SS water chanels
Vacuum system
Mechanical pump, Booster Pump, 2 Turbo Pump (3,300 l/c)
Cathodic Arc Sources 180 mm diameter or circular, linear or cylindrical sputtering system replacing fully or partially cathodic arc sources
8-12
Rapid Plasma Heating System
1
Processes
Direct PVD, Ion Nitriding+PVD, PECVD, DLC, Hybrid Processes, Ion Stimulated Diffusion
Maximum power
250 KVA